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Dependence of the structural, the electrical, and the optical properties on the Ar/O2 flow rate ratios for SnO2 thin films grown on p-InSb (111) substrates

✍ Scribed by T.W. Kim


Book ID
114065691
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
126 KB
Volume
36
Category
Article
ISSN
0025-5408

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Hafnium dioxide (HfO 2 ) thin films were deposited on a quartz substrate by RF reactive magnetron sputtering. The influence of O 2 /Ar flow ratio on the deposition rate, structure and optical properties of HfO 2 thin films were systematically studied using X-ray diffraction (XRD), scan electron micr