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Dependence of the sputtering yield on focussing chainlength

โœ Scribed by S.D. Dey; D. Basu; S.B. Karmohapatro


Publisher
Elsevier Science
Year
1970
Weight
214 KB
Volume
77
Category
Article
ISSN
0029-554X

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The effect of microrelief evolution on t
โœ N.N. Andrianova; A.M. Borisov; E.S. Mashkova; A.S. Nemov; V.I. Shulga ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 185 KB

The dynamically steady-state surface relief of polycrystalline copper sputtered by high-dose (10 18 -10 19 ion/cm 2 ) 30 keV Ar + ion bombardment at room temperature has been traced as a function of the ion incidence angle h i in a wide (0-80ยฐ) angular range. For each incidence angle the distributio