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Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

✍ Scribed by David C. Tully; Kathryn Wilder; Jean M. J. Fréchet; Alexander R. Trimble; Calvin F. Quate

Publisher: John Wiley and Sons
Year: 1999
Tongue: English
Weight: 376 KB
Volume: 11
Category: Article
ISSN: 0935-9648
DOI: 10.1002/(sici)1521-4095(199903)11:4<314::aid-adma314>3.0.co;2-e

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