Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking

✍ Scribed by Chan, K.K.; Amaratunga, G.A.J.; Wong, T.K.S.

• Book ID: 122826729
• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 926 KB
• Volume: 1
• Category: Article
• ISSN: 0925-9635
• DOI: 10.1016/0925-9635(92)90040-U