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Defect production in heavily doped n-Si irradiated with fast electrons at cryogenic temperatures

โœ Scribed by V.V. Emtsev; P. Ehrhart; K.V. Emtsev; D.S. Poloskin; U. Dedek


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
138 KB
Volume
376-377
Category
Article
ISSN
0921-4526

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It has been revealed that self-interstitials formed under low intensity electron irradiation in high resistivity p-type silicon can be retained frozen up to room temperature. Low thermal mobility of the self-interstitials suggests that Frenkel pairs in silicon can be stable at temperatures of about