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Defect-free silicon film on SiO2 formed by zone melting recrystallization with high scanning speed

✍ Scribed by Lianjun Liu; Pei-Hsin Tsien; Zhijian Li


Book ID
114536534
Publisher
IEEE
Year
1990
Tongue
English
Weight
816 KB
Volume
37
Category
Article
ISSN
0018-9383

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