Deep etch-induced damage during ion-assisted chemical etching of sputtered indium–zinc–oxide films in Ar/CH4/H2 plasmas

✍ Scribed by L. Stafford; W.T. Lim; S.J. Pearton; Ju-Il Song; Jae-Soung Park; Young-Woo Heo; Joon-Hyung Lee; Jeong-Joo Kim; M. Chicoine; F. Schiettekatte

• Book ID: 108289770
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 486 KB
• Volume: 516
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2007.05.071