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Deep Electron Trapping Centers in Si-Doped InAlAs Grown by Molecular Beam Epitaxy

✍ Scribed by Nakashima, K. ;Nojima, S. ;Kawamura, Y. ;Asahi, H.


Publisher
John Wiley and Sons
Year
1987
Tongue
English
Weight
379 KB
Volume
103
Category
Article
ISSN
0031-8965

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Deep hole traps in Be-doped Al0.2Ga0.8As
✍ J. Szatkowski; K. SieraΕ„ski; A. Hajdusianek; E. PΕ‚aczek-Popko πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 195 KB

Deep hole traps in Be doped p-type Al 0.2 Ga 0.8 As grown by molecular beam epitaxy have been studied by the deeplevel transient-spectroscopy method applied to samples with a Schottky diode configuration. Six hole traps, labeled as H1-H6, were found. Activation energies and capture cross sections ha