Deactivation of arsenic as an acceptor by ion implantation and reactivation by low-temperature anneal

✍ Scribed by D. Chandra; H. F. Schaake; M. A. Kinch; P. D. Dreiske; T. Teherani; F. Aqariden; D. F. Weirauch; H. D. Shih

• Book ID: 107453337
• Publisher: Springer US
• Year: 2005
• Tongue: English
• Weight: 342 KB
• Volume: 34
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-005-0033-5