Das Integrationspotential mesoporöser SiO2-Schichten als ultra-low-k Dielektrikum. Mesoporous SiO2 as low-k dielectric for integration in Cu/low-k interconnect systems

✍ Scribed by S. Frühauf; S.E. Schulz; Th. Gessner

• Book ID: 111701986
• Publisher: John Wiley and Sons
• Year: 2004
• Tongue: English
• Weight: 214 KB
• Volume: 16
• Category: Article
• ISSN: 0947-076X
• DOI: 10.1002/vipr.200400226