CVD and PVD copper integration for dual damascene metallization in a 0.18 μm process

✍ Scribed by M Proust; F Judong; J.M Gilet; L Liauzu; R Madar

• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 820 KB
• Volume: 55
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(00)00456-1