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Current/voltage characteristic collapse in AlGaN/GaN heterostructure insulated gate field effect transistors at high drain bias

✍ Scribed by Khan, M.A.; Shur, M.S.; Chen, Q.C.; Kuznia, J.N.


Book ID
115458965
Publisher
The Institution of Electrical Engineers
Year
1994
Tongue
English
Weight
232 KB
Volume
30
Category
Article
ISSN
0013-5194

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## Abstract Al~2~O~3~/Si~3~N~4~ insulated‐gate AlGaN/GaN heterostructure field‐effect transistors (HFETs) have been fabricated, where the regrown ohmic structure was incorporated to reduce the contact resistance. Excellent DC and RF characteristics have been obtained together with the low gate leak