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Current-induced conditioning of hydrogenated amorphous carbon thin films for field emission

✍ Scribed by Carey, J.D.; Silva, S.R.P.

Book ID
123251008
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
304 KB
Volume
10
Category
Article
ISSN
0925-9635

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A fabrication process of silicon field-emission arrays is reported, in which thin films of amorphous hydrogenated carbon (a-C:H) are employed as masks in a two-step plasma-etching process, using pure SF 6 and a mixture of SF 6 and O 2 . In comparison with processes that involve SiO 2 masks, the use