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Crystallization of amorphous thin LPCVD Si films: “in situ” TEM measurement of nucleation and grain growth rates

✍ Scribed by J.P Guillemet; B de Mauduit; B Pieraggi; D Bielle-Daspet; E Scheid


Book ID
108026802
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
575 KB
Volume
173
Category
Article
ISSN
0921-5093

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