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Crystallization by post-treatment of reactive r.f.-magnetron-sputtered carbon nitride films

โœ Scribed by Chen, G.L.; Li, Y.; Lin, J.; Huan, C.H.A.; Guo, Y.P.

Book ID
123568886
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
351 KB
Volume
8
Category
Article
ISSN
0925-9635

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โœ Chen, G. L.; Li, Y.; Lin, J.; Huan, C. H. A.; Guo, Y. P. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 106 KB

Thin films of CN x were deposited by reactive r.f.-magnetron sputtering on Si(100) substrates. The effect of annealing temperatures on the structural properties of the films has been studied by Fourier transform infrared (FTIR) spectroscopy, x-ray photoelectron spectroscopy (XPS) and transmission el