Crystallization and failure behavior of Ta-TM (TM=Fe, Co) nanostructured/amorphous diffusion barriers for copper metallization

✍ Scribed by J. S. Fang; T. P. Hsu; G. S. Chen

• Book ID: 107453688
• Publisher: Springer US
• Year: 2006
• Tongue: English
• Weight: 268 KB
• Volume: 35
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-006-0178-x