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Critical issues in the formation of quantum computer test structures by ion implantation

✍ Scribed by T. Schenkel; C.C. Lo; C.D. Weis; A. Schuh; A. Persaud; J. Bokor

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
582 KB
Volume
267
Category
Article
ISSN
0168-583X

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πŸ“œ SIMILAR VOLUMES

Ion-implantation issues in the formation
Ion-implantation issues in the formation of shallow junctions in germanium
✍ E. Simoen; A. Satta; A. D’Amore; T. Janssens; T. Clarysse; K. Martens; B. De Jae πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 361 KB

This paper provides an overview of the current state-of-the-art in the formation of shallow junctions in germanium by ion implantation, covering the issues of dopant activation, diffusion and defect removal. As will be shown, for the case of p + implantations, the application of rapid thermal anneal