Cracking mechanism in AlN(11―20)/α-Al2O3(1―102) heteroepitaxial films grown by MOCVD

✍ Scribed by K. Kaigawa; T. Shibata; Y. Nakamura; K. Asai; M. Tanaka; H. Sakai; T. Tsurumi

• Book ID: 110368610
• Publisher: Springer
• Year: 2001
• Tongue: English
• Weight: 674 KB
• Volume: 36
• Category: Article
• ISSN: 0022-2461
• DOI: 10.1023/a:1017998115037