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Correlations between the microstructure of Ag-Si3N4 multilayers and their optical properties

✍ Scribed by T. Girardeau; S. Camelio; D. Babonneau; J. Toudert; A. Barranco


Book ID
113936794
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
421 KB
Volume
455-456
Category
Article
ISSN
0040-6090

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Silicon nitride layers of 140 nm thickness were deposited on silicon wafers by low pressure chemical vapour deposition (LPCVD) and irradiated at GANIL with Pb ions of 110 MeV up to a maximum fluence of 4 Γ‚ 10 13 cm Γ€2 . As shown in a previous work these irradiation conditions, characterized by a pre