Correlation between the O+2 induced electron emission coefficient and the removal rate of Cu impurities segregated at the SiO2/Si interface

✍ Scribed by Wittmaack, K.; Homma, Y.

• Book ID: 111947721
• Publisher: American Institute of Physics
• Year: 1991
• Tongue: English
• Weight: 690 KB
• Volume: 58
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.104985