## Abstract In this study, thin films of Er~2~O~3~ are deposited by lowβpressure metalβorganic chemical vapor deposition (MOCVD) using a tris(isopropylcyclopentadienyl)erbium precursor and O~2~ on various substrates, including pβtype Si(100), Si(111), Corning glass, and __c__βaxisβoriented Ξ±βAl~2~O
β¦ LIBER β¦
Correlation between structure and properties of Er2O3 nanocrystalline thin films
β Scribed by Maria M. Giangregorio; Alberto Sacchetti; Maria Losurdo; Pio Capezzuto; Giovanni Bruno
- Book ID
- 116671055
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 509 KB
- Volume
- 354
- Category
- Article
- ISSN
- 0022-3093
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