## Abstract In this study, thin films of Er~2~O~3~ are deposited by low‐pressure metal–organic chemical vapor deposition (MOCVD) using a tris(isopropylcyclopentadienyl)erbium precursor and O~2~ on various substrates, including p‐type Si(100), Si(111), Corning glass, and __c__‐axis‐oriented α‐Al~2~O
✦ LIBER ✦
Multifunctional Nanocrystalline Thin Films of Er2O3: Interplay between Nucleation Kinetics and Film Characteristics
✍ Scribed by M. Losurdo; M. M. Giangregorio; P. Capezzuto; G. Bruno; R. G. Toro; G. Malandrino; I. L. Fragalà; L. Armelao; D. Barreca; E. Tondello; A. A. Suvorova; D. Yang; E. A. Irene
- Publisher
- John Wiley and Sons
- Year
- 2008
- Tongue
- English
- Weight
- 40 KB
- Volume
- 18
- Category
- Article
- ISSN
- 1616-301X
No coin nor oath required. For personal study only.
✦ Synopsis
In the right column of page 84 (11th line from bottom), there is one sentence: "Also, the sidewalls of the Au nanosheets with regular hexagonal or triangular shape should be terminated with {110} planes, as concluded from the angles between adjacent edges and the {111} basal plane." The notation "{110} planes" should be replaced with " f112g planes".
📜 SIMILAR VOLUMES
Multifunctional Nanocrystalline Thin Fil
✍
M. Losurdo; M. M. Giangregorio; P. Capezzuto; G. Bruno; R. G. Toro; G. Malandrin
📂
Article
📅
2007
🏛
John Wiley and Sons
🌐
English
⚖ 290 KB