Control of Thickness and Composition Variation of AlGaN/GaN on 6- and 8-in. Substrates Using Multiwafer High-Growth-Rate Metal Organic Chemical Vapor Deposition Tool

✍ Scribed by Yano, Yoshiki; Tokunaga, Hiroki; Shimamura, Hayato; Yamaoka, Yuya; Ubukata, Akinori; Tabuchi, Toshiya; Matsumoto, Koh

• Book ID: 125982413
• Publisher: Institute of Pure and Applied Physics
• Year: 2013
• Tongue: English
• Weight: 590 KB
• Volume: 52
• Category: Article
• ISSN: 0021-4922
• DOI: 10.7567/JJAP.52.08JB06