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High-growth-rate AlGaN buffer layers and atmospheric-pressure growth of low-carbon GaN for AlGaN/GaN HEMT on the 6-in.-diameter Si substrate metal-organic vapor phase epitaxy system

✍ Scribed by Ubukata, Akinori; Yano, Yoshiki; Shimamura, Hayato; Yamaguchi, Akira; Tabuchi, Toshiya; Matsumoto, Koh


Book ID
121350495
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
565 KB
Volume
370
Category
Article
ISSN
0022-0248

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