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Control of the substrate temperature using a triode magnetron sputtering system

✍ Scribed by Duarte, D. A. (author);Sagás, J. C. (author);Fontana, L. C. (author);Da Silva Sobrinho, A. S. (author);Cinelli, M. J. (author)

Book ID
111862834
Publisher
EDP Sciences
Year
2010
Tongue
English
Weight
526 KB
Volume
52
Category
Article
ISSN
1286-0042

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The substrate temperature achieved during physical vapor deposition significantly affects the properties and phases of thin films. An Isoflux ICM-10 Dual Target Inverted Cylindrical Magnetron Sputtering system is used to deposit low temperature alpha-phase alumina, for which an experimentally determ