Control of the Composition and Structure of Silicon Oxycarbide and Oxynitride Glasses Derived from Polysiloxane Precursors
β Scribed by P. Hubert Mutin
- Book ID
- 110267442
- Publisher
- Springer
- Year
- 1999
- Tongue
- English
- Weight
- 123 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0928-0707
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π SIMILAR VOLUMES
Thin nanocrystalline silicon oxynitride films were synthesized for the first time at low temperatures (373-750 K) by inductively coupled plasma chemical vapor deposition (ICP-CVD) using gas mixture of oxygen and hexamethyldisilazane Si 2 NH(CH 3 ) 6 (HMDS) as precursors. Single crystal Si (1 0 0) wa
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