Control of temperature coefficient of resistance by reactive sputtering of tantalum with nitrogen and oxygen simultaneously : G. I. Parisi, Proc. 1969 Electron. Compon. Conf., Washington D.C., 30 April–2 May (1969), p. 367

• Publisher: Elsevier Science
• Year: 1969
• Tongue: English
• Weight: 202 KB
• Volume: 8
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(69)90381-3