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Control of Carrier Concentration in Thin Cuprous Oxide Cu 2 O Films by Atomic Hydrogen

โœ Scribed by Tabuchi, Norikazu; Matsumura, Hideki


Book ID
125859328
Publisher
Institute of Pure and Applied Physics
Year
2002
Tongue
English
Weight
446 KB
Volume
41
Category
Article
ISSN
0021-4922

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In-situ growth of Y1Ba2Cu3O7โˆ’x thin film
โœ Aiguo Feng; Li Luo; J. Martin; C.J. Maggiore ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 565 KB

A temperature-controlled chemical vapor deposition (TC-CVD) process was developed for in-situ growth of highly c-axis orientated YtBa2Cu30~+x (YBCO) thin films directly on sapphire substrates. This new CVD process, for the first time, uses programmable temperature controllers to optimize and tailor