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Contour deposition—A new epitaxial deposition technique for semiconductor devices and integrated circuits

✍ Scribed by T. Klein

Publisher: Elsevier Science
Year: 1966
Tongue: English
Weight: 733 KB
Volume: 9
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(66)90072-4

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