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Concentration profiles of high dose MeV oxygen implanted silicon

✍ Scribed by K. Touhouche; J. Jackman; A. Yelon


Book ID
113283507
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
347 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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πŸ“œ SIMILAR VOLUMES


High dose MeV oxygen ion implantation in
✍ W Wesch; A Heft; H Hobert; G Peiter; E Wendler; T Bachmann πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 173 KB