Carrier concentration profiles in multiply implanted silicon with 0.5–7.5 MeV phosphorus

✍ Scribed by Wu Yuguang; Zhang Huixing; Zhang Xioji; Luo Yan; Zhang Tonghe; Han Zhuen

• Book ID: 113280210
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 466 KB
• Volume: 39
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(89)90819-7