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Compositional investigation of sputtered amorphous SiOX:H

✍ Scribed by F. Stolze; M. Zacharias; S. Schippel; B. Garke

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
279 KB
Volume
87
Category
Article
ISSN
0038-1098

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## Abstract Silicon‐oxygen amorphous thin film alloys (a‐SiO~x~) are grown at room temperature by plasma‐enhanced (PE)CVD on two dental materials; a ceramic and a microcomposite resin. A compositional analysis of substrates and films is performed by energy dispersive X‐ray spectroscopy (EDX), while