We report on the development of a soft UV-nanoimprint lithography (UV-NIL) based process to fabricate nanopatterned templates for epitaxy of site-controlled Stranski-Krastanov grown quantum dots. Surface cleaning and chemical native oxide removal processes are analyzed in detail. The quality of the
Composition uniformity of site-controlled InAs/GaAs quantum dots
✍ Scribed by G. Biasiol; V. Baranwal; S. Heun; M. Prasciolu; M. Tormen; A. Locatelli; T.O. Mentes; M.A. Niño; L. Sorba
- Book ID
- 104022132
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 462 KB
- Volume
- 323
- Category
- Article
- ISSN
- 0022-0248
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✦ Synopsis
We have studied the composition profiles of Stranski-Krastanov InAs/GaAs quantum dots grown on patterned nanohole arrays. Two dimensional surface chemical maps obtained by X-ray photoemission electron microscopy reveal a non-uniform composition profile similar to that of standard dots grown on planar surfaces, with an enhanced In concentration at the center of the islands, with respect to the wetting layer. A statistical analysis, however, revealed an improvement of about 50% of dot composition uniformity associated with the already reported enhancement of size uniformity. No significant size or composition variation was found by changing the period of the hole pattern from 250 to 600 nm.
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