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Comparisons of characterizations and tribological performance of TiN and CrN deposited by cathodic are plasma deposition process

โœ Scribed by Y.L. Su; S.H. Yao; C.T. Wu

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
741 KB
Volume
199
Category
Article
ISSN
0043-1648

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๐Ÿ“œ SIMILAR VOLUMES

Investigation of the microstructure and
Investigation of the microstructure and characterizations of TiN/CrN nanomultilayer deposited by unbalanced magnetron sputter process
โœ Cherng-Yuh Su; Cheng-Tang Pan; Tai-Pin Liou; Po-Ta Chen; Chung-Kwei Lin ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 986 KB

In this study, TiN, and CrN, monolayer thin films and a TiN/CrN multilayer thin film were deposited onto WC substrates by unbalance DC magnetron sputtering. Single-layer TiN and CrN thin films were prepared at various nitrogen flow rates (20-30 sccm). TiN/CrN multilayers with a monolayer thickness o

Comparison of ZrN and TiN formed by plas
Comparison of ZrN and TiN formed by plasma based ion implantation & deposition
โœ S. Heinrich; S. Schirmer; D. Hirsch; J.W. Gerlach; D. Manova; W. Assmann; S. Mรคn ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 989 KB

ZrN and TiN films have been deposited on Si substrates without additional heating using plasma based ion implantation & deposition (PBII&D) with pulse voltage from 0 to 5 kV. High quality columnar films have been obtained in both systems with a slight nitrogen deficiency. For ZrN, a marked reduction