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Comparison of thin films ofYBa2Cu3O7−x deposited by physical (laser ablation) and chemical (OMCVD) methods for device applications

✍ Scribed by M. Schieber; S.C. Han; Y. Ariel; S. Chokron; T. Tsach; M. Maharizi; C. Deutscher; D. Racah; A. Raizman; S. Rotter

No coin nor oath required. For personal study only.

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