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Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passiviation of silicon

✍ Scribed by Boris Veith; Florian Werner; Dimitri Zielke; Rolf Brendel; Jan Schmidt

No coin nor oath required. For personal study only.

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Effects of Increased Surface Area and Ch

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Phase equilibria in the H3Oβ″Al2O3H2

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