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Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride

✍ Scribed by O. Thomas; A. Charai; F.M. D'Heurle; T.G. Finstad; R.V. Joshi

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 946 KB
Volume: 171
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(89)90641-x

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