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Comparison of profile tailing in SIMS analyses of various impurities in silicon using nitrogen, oxygen, and neon ion beams at near-normal incidence

โœ Scribed by Y. Homma; K. Wittmaack


Book ID
104721867
Publisher
Springer
Year
1990
Tongue
English
Weight
730 KB
Volume
50
Category
Article
ISSN
1432-0630

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