Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium–zinc-oxide films

✍ Scribed by W.T. Lim; L. Stafford; J.S. Wright; L.F. Vossa; R. Khanna; Ju-Il Song; Jae-Soung Park; Young Woo Heo; Joon-Hyung Lee; Jeong-Joo Kim; D.P. Norton; S.J. Pearton

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 830 KB
• Volume: 253
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2007.05.061