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Comparison of oxidized/nitrided Zr thin films on Si and SiC substrates

✍ Scribed by Wong, Yew Hoong; Cheong, Kuan Yew

Book ID
122804154
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
539 KB
Volume
39
Category
Article
ISSN
0272-8842

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## Abstract A simple and low‐cost technological approach for the straining of thin crystalline silicon (Si) films using porous silicon (PS) as stress generating nanomaterial is reported. Firstly, a technological approach allowing fabrication of thin Si films on a bulk meso‐PS substrate is described