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Comparison of CH4/H2 and C2H6/H2 inductively coupled plasma etching of ZnO

โœ Scribed by Wantae Lim; Lars Voss; Rohit Khanna; B.P. Gila; D.P. Norton; S.J. Pearton; F. Ren


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
977 KB
Volume
253
Category
Article
ISSN
0169-4332

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## CeH5CHzCsH4)2GdCl.THF]2 (1) and ( C ~H ~C H Z C ~H ~) ~E ~C I . T H F (2) were prepared by the reaction of LnC13 ( Ln=Gd, Er) with benzylcyclopentadienyl sodium in THF and characterized by elemental analysis, IR, 'H NMR, 13C NMR, MS and thermal gravimetry. The crystal structures of both compoun