𝔖 Bobbio Scriptorium

✦ LIBER ✦

Comparison of Aluminum Etch Rates in Carbon Tetrachloride and Boron Trichloride Plasmas

✍ Scribed by Tokunaga, K.

Book ID: 125429572
Publisher: The Electrochemical Society
Year: 1981
Tongue: English
Weight: 609 KB
Volume: 128
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2127518

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The Effect of Aluminum vs. Photoresist M

The Effect of Aluminum vs. Photoresist Masking on the Etching Rates of Silicon and Silicon Dioxide in CF[sub 4]∕O[sub 2] Plasmas

✍ Fedynyshyn, Theodore H. 📂 Article 📅 1987 🏛 The Electrochemical Society 🌐 English ⚖ 469 KB