Comparison between p-type dopants for shallow junction formation by diffusion from an ion implanted silicide

✍ Scribed by P. Lippens; K. Maex; L. Van Den Hove; R. De Keersmaecker

• Book ID: 113280187
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 566 KB
• Volume: 39
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(89)90796-9