Comparison between CoSi2 and TiSi2 as dopant source for shallow silicided junction formation

✍ Scribed by L. Van Den Hove; K. Maex; L. Hobbs; P. Pippens; R. De Keersmaecker; V. Probst; H. Schaber

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 791 KB
• Volume: 38
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(89)90564-3