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Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films

✍ Scribed by O. Brunkahl; W. Bock; K. Thoma; B.O. Kolbesen

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 449 KB
Volume: 252
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2005.02.015

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Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1&#xa0;0&#xa0;0) wafers – preparation of oxynitride films

Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films