The optical properties of silicon oxide (SiO x ) films, vacuum evaporated and thermally annealed in argon atmosphere at 700 ยฐC and 1000 ยฐC, have been studied by spectral ellipsometry and photoluminescence (PL) measurements. The thickness, complex refractive index values and composition of the films,
โฆ LIBER โฆ
Comparative study of the properties of ultrathin Si3N4 films with Auger electron spectroscopy, spectroscopic ellipsometry, and Raman spectroscopy
โ Scribed by Paloura, E. C.; Logothetidis, S.; Boultadakis, S.; Ves, S.
- Book ID
- 120078791
- Publisher
- American Institute of Physics
- Year
- 1991
- Tongue
- English
- Weight
- 722 KB
- Volume
- 59
- Category
- Article
- ISSN
- 0003-6951
- DOI
- 10.1063/1.105621
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