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Combinatorial growth and analysis of Ti–In–Zn–O films deposited by radio‐frequency and direct-current magnetron co-sputtering system

✍ Scribed by Gi-Seok Heo; Jae-Cheol Park; Byeong-Yun Oh; Sang-Ki Kim; Yu-Ri Lee; Dong-Chan Shin

No coin nor oath required. For personal study only.

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