Cold remote nitrogen plasma effects on pulsed laser deposited CNX films characteristics

✍ Scribed by C. Jama; P. Goudmand

• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 354 KB
• Volume: 36
• Category: Article
• ISSN: 0008-6223
• DOI: 10.1016/s0008-6223(98)00005-0

✦ Synopsis

Carbon nitride films were deposited by ablation of carbon molecular fragments from a graphite targets on a silicon substrate after few pulses of a localized transversely excited atmospheric pressure CO2 laser. Deposition media were either a non excited nitrogen flow or cold remote plasma of nitrogen. Fourier transform infrared spectra of the deposited films show a very efficient nitrogen fixation with C-N bands characteristic of tetrahedral carbon. The effect of the distance of deposition zone from the discharge is also discussed.