✦ LIBER ✦

CO2-laser-induced chemical vapour deposition of TiB2

✍ Scribed by J. Elders; P.A. Quist; B. Rooswijk; J.D.W. van Voorst; J. van Nieuwkoop

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 808 KB
Volume: 45
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(91)90212-f

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

CO2-laser-induced chemical vapour deposi

CO2-laser-induced chemical vapour deposition of polycrystalline silicon from silane

✍ D. Tonneau; G. Auvert; Y. Pauleau 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 655 KB

Laser-induced chemical vapour deposition

Laser-induced chemical vapour deposition of TiSi2: Aspects of deposition process, microstructure and resistivity

✍ Helena Westberg; Fredric Ericson; Jan Engqvist; Mats Boman; Jan-Otto Carlsson 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 879 KB

Ultrasonic chemical vapor deposition of

Ultrasonic chemical vapor deposition of TiB2 thick films

✍ Takehiko Takahashi; Hideaki Itoh 📂 Article 📅 1980 🏛 Elsevier Science 🌐 English ⚖ 353 KB

The chemical vapor deposition of TiB2 fr

The chemical vapor deposition of TiB2 from diborane

✍ H.O. Pierson; A.W. Mullendore 📂 Article 📅 1980 🏛 Elsevier Science 🌐 English ⚖ 272 KB

Silica deposition by excimer-laser-induc

Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration

✍ Betty León; Armin Klumpp; Pío González; Eduardo G. Parada; Dolores Fernández; Ju 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 781 KB

Silicon oxide films have been deposited on silicon wafers at low temperature by irradiation of the substrates with an ArF (A = 193 nm) excimer laser beam in a SiH, and N20 atmosphere. A systematic study of the growth rate and properties of the films as a function of the processing parameters (gas co

Deposition of TiB2 films by a co-sputter

Deposition of TiB2 films by a co-sputtering method

✍ T. Shikama; Y. Sakai; M. Fukutomi; M. Okada 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 318 KB