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CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics

โœ Scribed by Wu, E. Y.; Nowak, E. J.; Vayshenker, A.; Lai, W. L.; Harmon, D. L.


Book ID
120643370
Publisher
IBM
Year
2002
Tongue
English
Weight
263 KB
Volume
46
Category
Article
ISSN
0018-8646

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